Exploitation

The project has formally started January 1st, 2016. Only the deliverables under the dissemination work package (WP6) are public, this website being the first public deliverable. Next follow the introduction, summary and conclusions of the

First release of the exploitation plan


Introduction

Although the technology developed within WIPE will still be immature, there is the strong intention of several industrial parties for taking the next step in photonic – electronic (photronic) integration. Leading European industrial fabs such as Oclaro and Smart Photonics, have expressed a close interest in the hetero technology under development and both Effect Photonics and IBM have photronic integration on their design roadmaps. Since the industrial partners stressed the necessity of having easy access to the technology and its application, the WIPE consortium also aims at developing a photronic co-design platform (PDK) with a first library of standard building blocks. Initial access for industry to the successfully developed processes will be enabled shortly after the completion of the project via multi-project wafer runs coordinated by the JePPIX organisation.



Summary

The ambition of the WIPE project is to develop a generic technology platform which combines mature InP based integrated optics with industrially produced silicon electronics. On the short term the exploitation of the developments within the WIPE consortium will show itself in the incorporation of several new building blocks into the Process Design Kits of the partners that provide generic photonic InP technologies, such as a vertical coupler for out-coupling and on-wafer characterization, a horizontal adiabatic coupler to connect the InP membrane circuits with the polymer waveguides, a spot size convertor to efficiently connect to conventional optical fibers, a distributed feedback laser and an electro-absorption modulator. The photonic integrator community will be notified about the availability of such newly developed building blocks and Process Design Kits via the regular JePPIX communication channels, partner networks, conferences and during trade events. On the electronics side, the building blocks, design methodology insights, and knowledge acquired during the low-power TIA design will be used in other applications. Long-term the results of the WIPE project are twofold. On the one hand the academic partners will maintain their competitive edge in the field while training many Master students, PhD’s and post-docs, that ensure knowledge transfer to the industry and could start spin-offs. Moreover the WIPE results can lead to patents and licences, and will be exploited in further research and spin-offs on photronics. The industrial partners on the other hand will explore the commercial possibilities provided by the combination of photonic and electronic circuitry via the WIPE stacking technique. The industrialization of the membrane process developed in WIPE is foreseen to be comparatively easy to transfer to a cost-effective generic platform, for which partners IBM and Effect Photonics are potential end-users and JePPIX can act as broker. When viable, the project’s demonstrator vehicle will be industrialized into a transceiver commodity for datacenters. Finally the project will provide an assessment of the BiCMOS technology requirements for this domain.



Conclusions

The first exploitation of the work within the WIPE project will be the incorporation of several new photonic building blocks into the portfolio and Process Design Kits of the fabrication partners. On the electronics side, the design of the low-power TIA circuit will lead to new intellectual property. For the academic participants the impact also lies in both the training of PhD’s and Master students as in a continued attractiveness for partners and research projects. The economic possibilities enabled by the combination of electronic and photonic circuitry via the WIPE stacking technique are investigated by the industrial partners, while other fabs like Oclaro show a clear interest. Design houses such as Effect Photonics and IBM have photonics on their roadmaps. Shortly after the successful completion of the WIPE project, the JePPIX office will coordinate the first multi-project wafer runs. In short, the WIPE project will pave the way for a European Photronics platform that will be unique in the world.